An investigation of doping of SnO2 by ion implantation and application of ion-implanted films as gas sensors

Rastomjee CS, Dale RS, Schaffer RJ, Jones FH, Egdell RG, Georgiadis GC, Lee MJ, Tate TJ, Cao LL

Thin films of SnO2 were doped with 90 keV ions of Nb, Sb and Bi at a dose of 3 × 1016 ions cm-2. The implanted films were characterized by X-ray and ultraviolet photoemission spectroscopy, Auger depth profiling and sheet resistance measurements. Sb produces the most dramatic reduction in sheet resistance and is unique in introducing a sufficient concentration of electrons into the Sn 5s conduction band to be observable by photoemission. The response of the resistance of Sb-doped films to pulses of CH4, CO and H2O in a flow of synthetic air was investigated over a range of concentrations and temperatures. The films display relatively poor selectivity in their sensor response. By contrast, the more highly resistive Bi-doped films show marked selectivity towards CO relative to CH4 in sensor applications.