Thermal and ion-beam-induced etching of InP with chlorine

Murrell AJ, Price RJ, Jackman RB, Foord JS

Surface spectroscopic techniques have been used to investigate adsorption and thermal and ion-induced processes at the InP(100)-Cl2 interface. Two adsorption states are identified and etching reactions are interpreted in terms of surface chemical transformations and desorption processes involving these states.